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Vu, T. T. H.; Batenburg, K. M.; Aarnink, A. A.; Knežević, T.; Liu, X.; Nanver, L. K. Batch Furnace CVD of Pure Boron Layers on Si and GaN Substrates for Low-Leakage-Current Diode Fabrication. ETSD 2023, 33, 29-35.