Vu TTH, Batenburg KM, Aarnink AA, Knežević T, Liu X, Nanver LK. Batch furnace CVD of pure boron layers on Si and GaN substrates for low-leakage-current diode fabrication. ETSD [Internet]. 2023 Apr. 15 [cited 2025 Jun. 23];33(2):29-35. Available from: https://jst.vn/index.php/etsd/article/view/334