Fabrication of Sub-Micro Thin Layer Structures using Cyclopentanone Mix Solution as a Modified SU-8 3050
Main Article Content
Abstract
The SU-8 3000 series have been formulated for improved adhesion to the substrate and reduced coating stress than SU-8 2000 series. It is being used to fabricate microstructures in the range of thickness from some up to several hundred micrometers. However, it is hard to fabricate the layer of the SU-8 3000 series at sub-micrometer thinness. In this paper, we propose a procedure to reduce the thickness of the SU-8 3050 thin film. By mixing the SU-8 3050 with Cyclopentanone (CP) with different volume ratios, we can control viscosity of the mixture. Therefore, the thickness of the fabricated photoresist layer at 2000 rpm spincoating can be from 540 nm to 5330 nm. The mixing procedures of SU-8 fabrication have been optimized in order to enhance the unity of the thin layer photoresist. Some other fabrication factors are also investigated.
Keywords
Thin SU-8 photoresist, Cyclopentanone, Sub-micro thin layer
Article Details
References
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[2] C. Liu, "Recent Developments in Polymer MEMS," Adv. Mater., 19, (2007) 3783-3790.
[3] R. Martinez-Duarte and M. Madou, "SU-8 Photolithography and Its Impact on Microfluidics," in Microfluidics and Nanofluidics Handbook, CRC Press, (2011) 231-268.
[4] H. Lorenz, M. Despont, N. Fahrni, J. Brugger, P. Vettiger, and P. Renaud, "High-aspect-ratio. ultrathick, negative-tone near-UV photoresist and its applications for MEMS," Sensors Actuators A Phys.. 64, (1998) 33-39.
[5] J. Liu, B. Cai, J. Zhu, G. Ding, X. Zhao, C. Yang, and D. Chen, "Process research of high aspect ratio microstructure using SU-8 resist," Microsyst. Technol., 10, (2004) 265-268.
[6] R. Ghodssi and P. Lin, Eds., MEMS Materials and Processes Handbook, Boston, MA: Springer US, vol. 1, (2011).
[7] A. del Campo and C. Greiner, "SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography," J. Micromechanics Microengineering, 17. (2007) R81-R95.
[8] W. H. Teh, U. Dürig, U. Drechsler, C. G. Smith, and H.-J. Güntherodt, "Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography," J. Appl. Phys., 97, (2005) 054907.
[9] K. Y. Lee, "Micromachining applications of a high resolution ultrathick photoresist," J. Vac. Sci. Technol. B Microelectron. Nanom. Struct., 13, (1995) 3012.
[10] 1. Song and P. K. Ajmera, "Use of a photoresist sacrificial layer with SU-8 electroplating mould in MEMS fabrication," J. Micromechanics Microengineering, 13, (2003) 816-821.
[11] L. Thi Hoai Thuong, T. Thi Luyen, P. Duc Thanh. T. Van Vu Quan, P. Van Tong. T. Thi Nhat Anh, C. Thi Xuan, and M. Anh Tuan "Fabrication of PDMS-based microfluidic devices toward biomedical applications." J. Sci. Tech, 105, (2015) 038-042.
[12] M. T. Arroyo, L. J. Fernández, M. Agirregabiria, N. Ibañezl, J. Aurrekoetxea, and F. J. Blanco, "Novel all-polymer microfluidic devices monolithically integrated within metallic electrodes for SDS-CGE of proteins," J. Micromechanics Microengineering. 17.(2007) 1289-1298.
[13] R. Yang, S. A. Soper, and W. Wang, "Microfabrication of pre-aligned fiber bundle couplers using ultraviolet lithography of SU-8," Sensors Actuators A Phys., 127, (2006) 123-130.
[14] B. Y. Shew, C. H. Kuo, Y. C. Huang, and Y. H. Tsai, "UV-LIGA interferometer biosensor based on the SU-8 optical waveguide," Sensors Actuators A Phys., 120, (2005) 383-389.
[15] C. Yuan-Jen, "Novel Applications of SU-8 and ALD Materials in Fabrication of Micro- and Nano-Scale Devices," Univ. Color., (2008).
[16] K. Beckwith, "https://github.com/NanoLabStaff/nanolab/issues/19,"(2014).